TY  - JOUR
AU  - Rose, V.
AU  - Podgurski, V.
AU  - Costina, I.
AU  - Franchy, R.
TI  - Growth of ultra-thin amorphous Al2O3 films on CoAl(100)
JO  - Surface science
VL  - 541
SN  - 0039-6028
CY  - Amsterdam
PB  - Elsevier
M1  - PreJuSER-28487
SP  - 128
PY  - 2003
N1  - Record converted from VDB: 12.11.2012
AB  - The oxidation of a CoAl(100) surface at 300 K was studied by means of Auger electron spectroscopy, high resolution electron energy loss spectroscopy (EELS), low energy electron diffraction and scanning tunneling microscopy (STM). For an exposure less than or equal to 0.3 L, the oxygen atoms are chemisorbed on the CoAl(100) surface, while for a larger O-2 exposure the oxidation of the surface sets in. For an exposure greater than or equal to 300 L the surface is entirely covered with amorphous Al2O3 (alpha-Al2O3) whereas the Co atoms seem to be unaffected. The EEL spectra of alpha-Al2O3 exhibit Fuchs-Kliewer modes at around 640 and 890 cm(-1). The thickness of the alpha-Al2O3 film is estimated to be 7.1 +/- 0.7 Angstrom. The STM images show that the oxide grows as large islands which cover the whole surface. The band gap of the ultra-thin alpha-Al2O3 film on CoAl(100) is found to be 3.2 eV and thus it is strongly diminished with respect to the bulk value. (C) 2003 Elsevier B.V. All rights reserved.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000184970600012
DO  - DOI:10.1016/S0039-6028(03)00891-4
UR  - https://juser.fz-juelich.de/record/28487
ER  -