Hauptseite > Publikationsdatenbank > Growth of ultra-thin amorphous Al2O3 films on CoAl(100) > print

001     28487
005     20180210134524.0
024 7 _ |2 DOI
|a 10.1016/S0039-6028(03)00891-4
024 7 _ |2 WOS
|a WOS:000184970600012
037 _ _ |a PreJuSER-28487
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Chemistry, Physical
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Rose, V.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB14465
245 _ _ |a Growth of ultra-thin amorphous Al2O3 films on CoAl(100)
260 _ _ |a Amsterdam
|b Elsevier
|c 2003
300 _ _ |a 128
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Surface Science
|x 0039-6028
|0 5673
|v 541
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The oxidation of a CoAl(100) surface at 300 K was studied by means of Auger electron spectroscopy, high resolution electron energy loss spectroscopy (EELS), low energy electron diffraction and scanning tunneling microscopy (STM). For an exposure less than or equal to 0.3 L, the oxygen atoms are chemisorbed on the CoAl(100) surface, while for a larger O-2 exposure the oxidation of the surface sets in. For an exposure greater than or equal to 300 L the surface is entirely covered with amorphous Al2O3 (alpha-Al2O3) whereas the Co atoms seem to be unaffected. The EEL spectra of alpha-Al2O3 exhibit Fuchs-Kliewer modes at around 640 and 890 cm(-1). The thickness of the alpha-Al2O3 film is estimated to be 7.1 +/- 0.7 Angstrom. The STM images show that the oxide grows as large islands which cover the whole surface. The band gap of the ultra-thin alpha-Al2O3 film on CoAl(100) is found to be 3.2 eV and thus it is strongly diminished with respect to the bulk value. (C) 2003 Elsevier B.V. All rights reserved.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|c I01
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK252
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a Auger electron spectroscopy
653 2 0 |2 Author
|a low energy electron diffraction (LEED)
653 2 0 |2 Author
|a electron energy loss spectroscopy (EELS)
653 2 0 |2 Author
|a scanning tunneling microscopy
653 2 0 |2 Author
|a oxidation
653 2 0 |2 Author
|a cobalt
653 2 0 |2 Author
|a aluminum
653 2 0 |2 Author
|a aluminum oxide
653 2 0 |2 Author
|a amorphous thin films
700 1 _ |a Podgurski, V.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB9870
700 1 _ |a Costina, I.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB5492
700 1 _ |a Franchy, R.
|b 3
|u FZJ
|0 P:(DE-Juel1)VDB5400
773 _ _ |a 10.1016/S0039-6028(03)00891-4
|g Vol. 541, p. 128
|p 128
|q 541<128
|0 PERI:(DE-600)1479030-0
|t Surface science
|v 541
|y 2003
|x 0039-6028
856 7 _ |u http://dx.doi.org/10.1016/S0039-6028(03)00891-4
909 C O |o oai:juser.fz-juelich.de:28487
|p VDB
913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
|b Information
|0 G:(DE-Juel1)FUEK252
|x 0
914 1 _ |y 2003
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k ISG-3
|l Institut für Grenzflächen und Vakuumtechnologien
|d 31.12.2006
|g ISG
|0 I:(DE-Juel1)VDB43
|x 0
970 _ _ |a VDB:(DE-Juel1)22147
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-Juel1)PGI-3-20110106
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-3-20110106

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