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@ARTICLE{Kawamura:30247,
      author       = {Kawamura, M. and Paul, N. and Cherepanov, V. and
                      Voigtländer, B.},
      title        = {{N}anowires and {N}anorings at the {A}tomic {L}evel},
      journal      = {Physical review letters},
      volume       = {91},
      issn         = {0031-9007},
      address      = {College Park, Md.},
      publisher    = {APS},
      reportid     = {PreJuSER-30247},
      pages        = {096102},
      year         = {2003},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {The step-flow growth mode is used to fabricate Si and Ge
                      nanowires with a width of 3.5 nm and a thickness of one
                      atomic layer (0.3 nm) by self-assembly. Alternating
                      deposition of Ge and Si results in the formation of a
                      nanowire superlattice covering the whole surface. One atomic
                      layer of Bi terminating the surface is used to distinguish
                      between the elements Si and Ge. A difference in apparent
                      height is measured in scanning tunneling microscopy images
                      for Si and Ge. Also, different kinds of two-dimensional
                      Si/Ge nanostructures like alternating Si and Ge nanorings
                      having a width of 5-10 nm were grown.},
      keywords     = {J (WoSType)},
      cin          = {ISG-3},
      ddc          = {550},
      cid          = {I:(DE-Juel1)VDB43},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Physics, Multidisciplinary},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000185235000035},
      doi          = {10.1103/PhysRevLett.91.096102},
      url          = {https://juser.fz-juelich.de/record/30247},
}