TY  - JOUR
AU  - Rodriguez Contreras, J.
AU  - Kohlstedt, H.
AU  - Poppe, U.
AU  - Waser, R.
AU  - Buchal, Ch.
TI  - Surface treatment effects on the thickness dependence of the remanent polarization of PbZr0.52Ti0.48O3 capacitors
JO  - Applied physics letters
VL  - 83
SN  - 0003-6951
CY  - Melville, NY
PB  - American Institute of Physics
M1  - PreJuSER-32035
SP  - 126
PY  - 2003
N1  - Record converted from VDB: 12.11.2012
AB  - In this letter, we report on the thickness dependence of the remanent polarization of Pt/PbZr0.52Ti0.48O3/SrRuO3 capacitors. Two different patterning techniques were used to fabricate the capacitors. For lift-off processed capacitors, the remanent polarization decreased with decreasing thickness. Ion-beam-etched capacitors, however, showed a constant remanent polarization for all PbZr0.52Ti0.48O3 film thicknesses down to 23 nm. Remarkably, this constant remanent polarization for ion-beam-etched capacitors corresponds to the spontaneous polarization expected for a stress-free bulk PbZr0.52Ti0.48O3 crystal. (C) 2003 American Institute of Physics.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000183877800043
DO  - DOI:10.1063/1.1590431
UR  - https://juser.fz-juelich.de/record/32035
ER  -