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@ARTICLE{Jeliazova:3305,
author = {Jeliazova, Y. and Franchy, R.},
title = {{G}rowth of ultra thin {G}a and {G}a2{O}3 films on
{N}i(100)},
journal = {Surface science},
volume = {527},
issn = {0039-6028},
address = {Amsterdam},
publisher = {Elsevier},
reportid = {PreJuSER-3305},
pages = {57},
year = {2003},
note = {Record converted from VDB: 12.11.2012},
abstract = {The growth of ultra-thin films of Ga2O3 on Ni(1 0 0) was
investigated in the temperature range of 300-800 K by using
Auger electron spectroscopy, low energy electron diffraction
(LEED) and scanning tunneling microscopy. In addition, the
growth of Ga at 300 K was also studied. For the formation of
Ga2O3, first at 300 K, a 15 Angstrom thick Ga layer was
deposited on the Ni(1 0 0) surface. Oxygen adsorption until
saturation leads to the formation of a thin amorphous Ga
oxide on the top of a metallic Ga interlayer. Annealing up
to 700 K leads to the formation of a well-ordered thin film
of gamma'-Ga2O3 which is accompanied by a coalescence and
ordering of the Ga2O3 islands. Large terraces are found
which are separated by step heights of 2 Angstrom. The LEED
pattern shows a 12-fold ring structure, which originates
from two domains with hexagonal structure, which are rotated
by 90degrees with respect to each other. The lattice
constant of the hexagonal unit cells is determined to be 2.8
Angstrom. (C) 2003 Elsevier Science B.V. All rights
reserved.},
keywords = {J (WoSType)},
cin = {ISG-3},
ddc = {540},
cid = {I:(DE-Juel1)VDB43},
pnm = {Kondensierte Materie},
pid = {G:(DE-Juel1)FUEK242},
shelfmark = {Chemistry, Physical / Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000181571000017},
doi = {10.1016/S0039-6028(02)02681-X},
url = {https://juser.fz-juelich.de/record/3305},
}