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| Hauptseite > Publikationsdatenbank > Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour |
| Hauptseite > Publikationsdatenbank > Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour |
| Journal Article | PreJuSER-33962 |
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2003
Elsevier
Amsterdam [u.a.]
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Please use a persistent id in citations: doi:10.1016/S0040-6090(03)00949-0
Abstract: ZnO:Al films were prepared on glass substrates with different sputter techniques from ceramic ZnO:Al2O3 target as well as metallic Zn:Al targets using a wide range of deposition parameters. Independent of the sputter technique, sputter pressure and substrate temperature were found to have a major influence on the electrical and structural properties of the ZnO:Al films. With an increasing deposition pressure, we observed a strong decrease in the carrier mobility and also an increase of the etching rate. The surface morphology obtAlned after etching of RF sputtered ZnO:Al systematically changes from crater-like to hill-like surface appearance with increasing pressure. The correlation of sputter parameters, film growth and structural properties is discussed in terms of a modified Thornton model. (C) 2003 Elsevier Science B.V. All rights reserved.
Keyword(s): J ; etching (auto) ; sputtering (auto) ; surface morphology (auto) ; zinc oxide (auto)
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