% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @ARTICLE{Schelling:35289, author = {Schelling, C. and Myslivecek, J. and Mühlberger, M. and Lichtenberger, H. and Zhong, Z. and Voigtländer, B. and Bauer, G. and Schäffler, F.}, title = {{K}inetic and strain-driven growth phenomena on {S}i(001)}, journal = {Physica status solidi / A}, volume = {201}, issn = {0031-8965}, address = {Weinheim}, publisher = {Wiley-VCH}, reportid = {PreJuSER-35289}, pages = {324 - 328}, year = {2004}, note = {Record converted from VDB: 12.11.2012}, abstract = {Self-organization phenomena in semiconductors are usually based on strain-driven island growth during hetero epitaxial layer deposition. However, kinetic phenomena can become important and even dominating at the low growth temperatures usually employed during molecular beam epitaxy. We report on kinetic step bunching on Si(001), and identify the driving mechanism on the atomic scale via kinetic Monte Carlo simulations. Another phenomena discussed is facet formation during annealing of SiO2-covered Si(001) nanostructures at the relatively low temperatures usually employed for oxide desorption. Both phenomena are combined to facilitate perfect ordering of self-assembled Ge dots on facetted Si(001) nanostructure templates. (C) 2004 WILEY-VCH Verlag GmbH $\&$ Co. KGaA, Weinheim.}, keywords = {J (WoSType)}, cin = {ISG-3}, ddc = {530}, cid = {I:(DE-Juel1)VDB43}, pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik}, pid = {G:(DE-Juel1)FUEK252}, shelfmark = {Materials Science, Multidisciplinary / Physics, Applied / Physics, Condensed Matter}, typ = {PUB:(DE-HGF)16}, UT = {WOS:000188794900025}, doi = {10.1002/pssa.200303966}, url = {https://juser.fz-juelich.de/record/35289}, }