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| 001 | 35291 | ||
| 005 | 20230426083047.0 | ||
| 017 | _ | _ | |a This version is available at the following Publisher URL: http://prb.aps.org |
| 024 | 7 | _ | |a 10.1103/PhysRevB.69.125331 |2 DOI |
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| 024 | 7 | _ | |a 2128/2156 |2 Handle |
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| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 530 |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Cherepanov, V. |b 0 |u FZJ |0 P:(DE-Juel1)VDB10516 |
| 245 | _ | _ | |a Influence of material, surface reconstruction and strain of diffusion at a Ge(111) surface |
| 260 | _ | _ | |a College Park, Md. |b APS |c 2004 |
| 300 | _ | _ | |a 125331 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
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| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Physical Review B |x 1098-0121 |0 4919 |v 69 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a The measurement of the two-dimensional island density after submonolayer deposition is used to determine the effect of material, surface reconstruction, and strain on surface diffusion. Specifically prepared strained and relaxed Ge surfaces are used as templates. Scanning tunneling microscopy is used to determine the density of two-dimensional islands. The change of the material (from Si to Ge) increases the diffusion length substantially. The diffusion length is increased by a factor of 10 when the substrate material is changed from Si to Ge. The effect is weaker when the deposited material is changed. The diffusion barrier for Ge and Si adatoms is found to increase with increasing compressive strain of the Ge(111) substrate. Unexpectedly, the change of the surface reconstruction from (7 X 7) to (5 X 5) has negligible influence on the diffusion length. |
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| 700 | 1 | _ | |a Voigtländer, B. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5601 |
| 773 | 1 | 8 | |a 10.1103/physrevb.69.125331 |b American Physical Society (APS) |d 2004-03-22 |n 12 |p 125331 |3 journal-article |2 Crossref |t Physical Review B |v 69 |y 2004 |x 1098-0121 |
| 773 | _ | _ | |a 10.1103/PhysRevB.69.125331 |g Vol. 69, p. 125331 |p 125331 |n 12 |q 69<125331 |0 PERI:(DE-600)2844160-6 |t Physical review / B |v 69 |y 2004 |x 1098-0121 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1103/PhysRevB.69.125331 |u http://hdl.handle.net/2128/2156 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/35291/files/42229.pdf |y OpenAccess |
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| 913 | 1 | _ | |k I01 |v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |l Informationstechnologie mit nanoelektronischen Systemen |b Information |0 G:(DE-Juel1)FUEK252 |x 0 |
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