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@ARTICLE{Garcia:38552,
      author       = {Garcia, S. G. and Salinas, D. R. and Staikov, G.},
      title        = {{U}nderpotential {D}eposition of {C}d on {A}g(111): {A}n in
                      situ {STM} study},
      journal      = {Surface science},
      volume       = {576},
      issn         = {0039-6028},
      address      = {Amsterdam},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-38552},
      pages        = {9 - 18},
      year         = {2005},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {The kinetics and mechanism of Cd underpotential deposition
                      (UPD) and involved surface alloy formation processes the
                      system Ag(1 1 1)/Cd2+,SO42- are studied by means of combined
                      electrochemical measurements and in situ scanning tunneling
                      microscopy (STM). The results show that the UPD process
                      starts with a formation of an expanded (diluted) adlayer
                      with a superlattice structure Ag(1 1 1)-(root3- x
                      root19)R23.4degrees. In the underpotential range 50 mV <
                      DeltaE < 80 mV this adlayer transforms to a condensed close
                      packed Cd monolayer via a first order phase transition. At
                      long polarization times the condensed monolayer undergoes
                      structural changes involving place exchange processes
                      between Cd atoms and surface Ag atoms. A formation of a
                      second Cd monolayer and a significant Ag-Cd surface alloying
                      take place at lower underpotentials (DeltaE < 50 mV). The
                      kinetics of surface alloying are analyzed on the basis of a
                      recently proposed diffusion model including a relatively
                      fast initial formation of a very thin surface alloy film and
                      a subsequent slow alloy growth controlled by solid state
                      diffusion. The anodic dealloying results in an appearance of
                      monatornically deep pits, which disappear quickly at
                      relatively high underpotentials (DeltaE > 550 mV) indicating
                      a high mobility of surface Ag atoms. (C) 2004 Elsevier B.V.
                      All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {ISG-3 / CNI},
      ddc          = {540},
      cid          = {I:(DE-Juel1)VDB43 / I:(DE-Juel1)VDB381},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Chemistry, Physical / Physics, Condensed Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000226872600004},
      doi          = {10.1016/j.susc.2004.11.037},
      url          = {https://juser.fz-juelich.de/record/38552},
}