Home > Publications database > Fabrication of stress-induced SrRuO3 nanostructures by pulsed laser deposition > print |
001 | 39692 | ||
005 | 20180210142228.0 | ||
024 | 7 | _ | |2 DOI |a 10.1007/s00339-004-2811-y |
024 | 7 | _ | |2 WOS |a WOS:000222766100174 |
024 | 7 | _ | |2 ISSN |a 0947-8396 |
037 | _ | _ | |a PreJuSER-39692 |
041 | _ | _ | |a eng |
082 | _ | _ | |a 530 |
084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
084 | _ | _ | |2 WoS |a Physics, Applied |
100 | 1 | _ | |a Vasco, E. |b 0 |u FZJ |0 P:(DE-Juel1)VDB25976 |
245 | _ | _ | |a Fabrication of stress-induced SrRuO3 nanostructures by pulsed laser deposition |
260 | _ | _ | |c 2004 |a Berlin |b Springer |
300 | _ | _ | |a 1461 |
336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
336 | 7 | _ | |a ARTICLE |2 BibTeX |
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336 | 7 | _ | |a article |2 DRIVER |
440 | _ | 0 | |a Applied Physics A |x 0947-8396 |0 560 |v 79 |
500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
520 | _ | _ | |a The compressive stress originated in the coherent epitaxial-SrRuO3/LaAlO3 interface has been used as a nano-patterning tool for the creation of island and wire arrays in ultrathin (<20 nm) SrRuO3 films. The nanostructure, stoichiometry, and electrical properties of these arrays have been studied by X-ray diffraction, atomic force microscopy, Rutherford back-scattering spectroscopy and resistivity vs temperature measurements. The influence of the shadowing effect produced by the non-perpendicular incidence of the evaporated particles on the array morphology is discussed. |
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588 | _ | _ | |a Dataset connected to Web of Science |
650 | _ | 7 | |a J |2 WoSType |
700 | 1 | _ | |a Dittmann, R. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5464 |
700 | 1 | _ | |a Karthäuser, S. |b 2 |u FZJ |0 P:(DE-Juel1)130751 |
700 | 1 | _ | |a Waser, R. |b 3 |u FZJ |0 P:(DE-Juel1)131022 |
773 | _ | _ | |0 PERI:(DE-600)1398311-8 |a 10.1007/s00339-004-2811-y |g Vol. 79, p. 1461 |p 1461 |q 79<1461 |t Applied physics / A |v 79 |x 0947-8396 |y 2004 |
856 | 7 | _ | |u http://dx.doi.org/10.1007/s00339-004-2811-y |
909 | C | O | |o oai:juser.fz-juelich.de:39692 |p VDB |
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