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@ARTICLE{Skriniarova:40397,
      author       = {Skriniarova, J. and Bochem, P. and Fox, P. T. and Kordos,
                      P.},
      title        = {{P}hotoenhanced wet etching of gallium nitride in
                      {KOH}-based solution},
      journal      = {Journal of vacuum science $\&$ technology / B},
      volume       = {19},
      issn         = {0734-211X},
      address      = {New York, NY},
      publisher    = {Inst.},
      reportid     = {PreJuSER-40397},
      pages        = {1721},
      year         = {2001},
      note         = {Record converted from VDB: 12.11.2012},
      cin          = {ISG-1 / ISG-2},
      ddc          = {530},
      cid          = {I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB42},
      pnm          = {Halbleiterbauelemente und Analytik / Ionen- und
                      Lithographietechnik},
      pid          = {G:(DE-Juel1)FUEK68 / G:(DE-Juel1)FUEK66},
      typ          = {PUB:(DE-HGF)16},
      url          = {https://juser.fz-juelich.de/record/40397},
}