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@ARTICLE{Wang:40432,
author = {Wang, S. and Coffa, S. and Carius, R. and Buchal, C.},
title = {{E}fficient electroluminescence from rare earth doped {MOS}
diodes},
journal = {Materials science and engineering / B},
volume = {81},
issn = {0921-5107},
address = {New York, NY [u.a.]},
publisher = {Elsevier},
reportid = {PreJuSER-40432},
pages = {102 - 104},
year = {2001},
note = {Record converted from VDB: 12.11.2012},
abstract = {Efficient infra-red and visible electroluminescence (EL)
has been obtained from implanted rare earth ions in the SiO2
of a silicon-metal-oxide-semiconductor (MOS) diode structure
at room temperature. The rare earth ions are excited by the
direct impact of hot electrons tunneling through the oxide
at electric fields larger than 6 MV cm(-1). The internal
quantum efficiencies of Er and Tb implanted MOS diodes are
estimated at 10 and $3\%,$ respectively. The high quantum
efficiency is due to the high impact excitation
cross-section > 10(-15) cm(-2). These observations on MOS
structures are an experimental pl oof for efficient light
generation by hot electron impact. (C) 2001 Elsevier Science
B.V. All rights reserved.},
keywords = {J (WoSType)},
cin = {ISG-1 / IPV},
ddc = {600},
cid = {I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB46},
pnm = {Ionentechnik / Grundlagen und Technologie von
Dünnschichtsolarzellen},
pid = {G:(DE-Juel1)FUEK67 / G:(DE-Juel1)FUEK70},
shelfmark = {Materials Science, Multidisciplinary / Physics, Condensed
Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000168392800026},
doi = {10.1016/S0921-5107(00)00668-1},
url = {https://juser.fz-juelich.de/record/40432},
}