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@INPROCEEDINGS{Hollnder:40615,
      author       = {Holländer, B. and Lenk, S. and Mantl, S. and Trinkaus, H.
                      and Kirch, D. and Luysberg, M. and Herzog, H.-J. and
                      Hackbarth, T. and Fichtner, P. F. P.},
      title        = {{S}ubstrate engineering by hydrogen or helium implantation
                      for epitaxial growth of lattice mismatched {S}i(1-x){G}ex
                      films on silicon},
      reportid     = {PreJuSER-40615},
      isbn         = {0-7803-6462-7},
      year         = {2001},
      note         = {Record converted from VDB: 12.11.2012},
      comment      = {Proceedings of 2000 International Conference on Ion
                      Implantation Technology. - 2001. - 0-7803-6462-7. - S. 326},
      booktitle     = {Proceedings of 2000 International
                       Conference on Ion Implantation
                       Technology. - 2001. - 0-7803-6462-7. -
                       S. 326},
      cin          = {ISG-1 / IFF-TH-III / IFF-IMF / IME},
      cid          = {I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB32 / I:(DE-Juel1)VDB37 /
                      I:(DE-Juel1)VDB54},
      pnm          = {Ionentechnik},
      pid          = {G:(DE-Juel1)FUEK67},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
      url          = {https://juser.fz-juelich.de/record/40615},
}