Hauptseite > Publikationsdatenbank > Formation of shallow junctions in Si-nanostructures > print

001     40879
005     20180210133927.0
037 _ _ |a PreJuSER-40879
100 1 _ |a Hogg, S. M.
|0 P:(DE-Juel1)VDB5978
|b 0
|u FZJ
111 2 _ |c Erlangen
|d 2001-09-10
245 _ _ |a Formation of shallow junctions in Si-nanostructures
260 _ _ |c 2001
295 1 0 |a Ion Beam Processing of Semiconductors Workshop
336 7 _ |a Talk (non conference)
|0 PUB:(DE-HGF)31
|2 PUB:(DE-HGF)
|x Invited
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a Other
|2 DataCite
336 7 _ |a Other
|2 DINI
336 7 _ |a INPROCEEDINGS
|2 BibTeX
336 7 _ |a LECTURE_SPEECH
|2 ORCID
500 _ _ |a Record converted from VDB: 12.11.2012
500 _ _ |3 Talk (non conference)
536 _ _ |a Ionentechnik
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700 1 _ |a Rije, E.
|0 P:(DE-Juel1)VDB5979
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700 1 _ |a Moers, J.
|0 P:(DE-Juel1)VDB5547
|b 2
|u FZJ
700 1 _ |a Trellenkamp, S.
|0 P:(DE-Juel1)128856
|b 3
|u FZJ
700 1 _ |a Bay, H. L.
|0 P:(DE-Juel1)VDB5980
|b 4
|u FZJ
700 1 _ |a Lenk, S.
|0 P:(DE-Juel1)128602
|b 5
|u FZJ
700 1 _ |a Mantl, S.
|0 P:(DE-Juel1)VDB4959
|b 6
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909 C O |o oai:juser.fz-juelich.de:40879
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913 1 _ |k 29.87.0
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|l Grundlagenforschung zur Informationstechnik
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914 1 _ |y 2001
920 1 _ |k ISG-1
|l Institut für Halbleiterschichten und Bauelemente
|d 31.12.2006
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970 _ _ |a VDB:(DE-Juel1)5566
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a talk
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-9-20110106

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