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000040904 084__ $$2WoS$$aMaterials Science, Coatings & Films
000040904 084__ $$2WoS$$aPhysics, Applied
000040904 1001_ $$0P:(DE-HGF)0$$aLevichkova, M.$$b0
000040904 245__ $$aStructure and properties of nanosized electron beam deposited zirconia thin films
000040904 260__ $$aAmsterdam [u.a.]$$bElsevier Science$$c2001
000040904 300__ $$a70
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000040904 440_0 $$05670$$aSurface and Coatings Technology$$v141$$x0257-8972
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000040904 520__ $$aThin films of amorphous zirconium oxide are deposited in high vacuum via the electron gun evaporation of pure ZrO2 within a large scale of vapour incidence angles. A nanosized grain surface structure and columnar growth morphology are revealed by electron optical methods. It is demonstrated that the oblique deposition results in both column inclination and anisotropy of the column cross section that are related to the vapour beam incidence. The revealed structure is found to influence the Knoop microhardness, DC conductivity and the effective refractive index by inducing in-plane anisotropy, which is most pronounced at high vapour incidence angles. The dependence of these properties on the vapour incidence is explained with the nanodimensionality of the film morphological features. Finally, it is shown how an excimer laser processing modifies both the structure and properties of the zirconia films. (C) 2001 Elsevier Science B.V. All rights reserved.
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000040904 65320 $$2Author$$azirconia thin films
000040904 65320 $$2Author$$aoblique vacuum deposition
000040904 65320 $$2Author$$ananosized structure and properties
000040904 65320 $$2Author$$aexcimer laser modification
000040904 7001_ $$0P:(DE-HGF)0$$aMankov, V.$$b1
000040904 7001_ $$0P:(DE-Juel1)VDB5992$$aStarbov, N.$$b2$$uFZJ
000040904 7001_ $$0P:(DE-HGF)0$$aKarashanova, D.$$b3
000040904 7001_ $$0P:(DE-HGF)0$$aMednikarov, B.$$b4
000040904 7001_ $$0P:(DE-Juel1)VDB5995$$aStarbova, K.$$b5$$uFZJ
000040904 773__ $$0PERI:(DE-600)1502240-7$$a10.1016/S0257-8972(01)01162-8$$gVol. 141, p. 70$$p70$$q141<70$$tSurface and coatings technology$$v141$$x0257-8972$$y2001
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000040904 9141_ $$y2001
000040904 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000040904 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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