001     41464
005     20180210135058.0
024 7 _ |2 DOI
|a 10.1080/10584580490441197
024 7 _ |2 WOS
|a WOS:000221024200004
037 _ _ |a PreJuSER-41464
041 _ _ |a eng
082 _ _ |a 620
084 _ _ |2 WoS
|a Engineering, Electrical & Electronic
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Fitsilis, M.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB25896
245 _ _ |a A new concept for using ferroelectric transistors in nonvolatile memories
260 _ _ |a London [u.a.]
|b Taylor & Francis
|c 2004
300 _ _ |a 45 - 58
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Integrated Ferroelectrics
|x 1058-4587
|0 2659
|v 60
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a A new concept for using a ferroelectric field effect transistor in a memory configuration is presented without the requirement of a negative voltage or an erase operation. The transistor is designed so that the accumulation sets in at a lower gate source voltage making it possible to reverse the polarization without applying a negative pulse to the gate.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|c I01
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK252
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a ferroelectric field effect transistor
653 2 0 |2 Author
|a FeFET
653 2 0 |2 Author
|a MFIS
653 2 0 |2 Author
|a BSIM3v3
653 2 0 |2 Author
|a non-volatile memory
653 2 0 |2 Author
|a non-destructive readout
700 1 _ |a Kohlstedt, H.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB3107
700 1 _ |a Waser, R.
|b 2
|u FZJ
|0 P:(DE-Juel1)131022
700 1 _ |a Ullmann, M.
|b 3
|0 P:(DE-HGF)0
773 _ _ |a 10.1080/10584580490441197
|g Vol. 60, p. 45 - 58
|p 45 - 58
|q 60<45 - 58
|0 PERI:(DE-600)2037916-X
|t Integrated ferroelectrics
|v 60
|y 2004
|x 1058-4587
856 7 _ |u http://dx.doi.org/10.1080/10584580490441197
909 C O |o oai:juser.fz-juelich.de:41464
|p VDB
913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
|b Information
|0 G:(DE-Juel1)FUEK252
|x 0
914 1 _ |y 2004
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
|g CNI
|z 381
|0 I:(DE-Juel1)VDB381
|x 1
920 1 _ |k IFF-IEM
|l Elektronische Materialien
|d 31.12.2006
|g IFF
|0 I:(DE-Juel1)VDB321
|x 0
970 _ _ |a VDB:(DE-Juel1)57235
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a I:(DE-Juel1)PGI-7-20110106
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-7-20110106


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