% IMPORTANT: The following is UTF-8 encoded. This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.
@ARTICLE{Bobisch:4253,
author = {Bobisch, C. A. and Bannani, A. and Koroteev, Y. M. and
Bihlmayer, G. and Chulkov, E. V. and Möller, R.},
title = {{C}onservation of the lateral electron momentum at a metal
semiconductor interface studied by ballistic electron
emission microscopy},
journal = {Physical review letters},
volume = {102},
issn = {0031-9007},
address = {College Park, Md.},
publisher = {APS},
reportid = {PreJuSER-4253},
pages = {136807},
year = {2009},
note = {Financial support by the Deutsche Forschungsgemeinschaft
through the SFB 616 "Energy Dissipation at Surfaces'' is
gratefully acknowledged.},
abstract = {We report on ballistic electron emission microscopy and
spectroscopy studies on epitaxial (3-5 nm thick) Bi(111)
films, grown on n-type Si substrates. The effective barrier
heights of the Schottky barrier observed are 0.58 eV for the
Bi/Si(100)-(2x1) and 0.68 eV for the Bi/Si(111)-(7x7). At
the step edges of the epitaxial films a strong increase of
the ballistic electron emission microscopy current is
observed for Bi/Si(111)-(7x7), while no increase occurs for
Bi/Si(100)-(2x1). These observations can be explained by the
conservation of the lateral momentum of the electron at the
metal-semiconductor interface.},
keywords = {J (WoSType)},
cin = {IFF-1 / IAS-1 / JARA-FIT},
ddc = {550},
cid = {I:(DE-Juel1)VDB781 / I:(DE-Juel1)IAS-1-20090406 /
$I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Multidisciplinary},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000264888600056},
doi = {10.1103/PhysRevLett.102.136807},
url = {https://juser.fz-juelich.de/record/4253},
}