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000044136 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000044136 084__ $$2WoS$$aMaterials Science, Coatings & Films
000044136 084__ $$2WoS$$aPhysics, Applied
000044136 084__ $$2WoS$$aPhysics, Condensed Matter
000044136 1001_ $$0P:(DE-Juel1)VDB5924$$aKlein, S.$$b0$$uFZJ
000044136 245__ $$aIntrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications
000044136 260__ $$aAmsterdam [u.a.]$$bElsevier$$c2001
000044136 300__ $$a305 - 309
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000044136 520__ $$aThe influence of various deposition parameters on the electrical and optical properties and the structure of amorphous and microcrystalline silicon films was investigated for material prepared by hot-wire (HW) CVD in a new multichamber deposition system, designed for the development of thin film solar cells. Prior to the material studies, careful measurement of the real substrate temperature under the influence of additional HW heating was performed. While good electronic quality and solar cell performance was found for a-Si:H layers, the Lc-Si:H material showed very high spin densities, porosity and a characteristic structural inhomogeneity along the growth axis. (C) 2001 Elsevier Science B.V. All rights reserved.
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000044136 65320 $$2Author$$ahot-wire CVD
000044136 65320 $$2Author$$astructural properties
000044136 65320 $$2Author$$asolar cells
000044136 65320 $$2Author$$asilicon
000044136 7001_ $$0P:(DE-Juel1)130238$$aFinger, F.$$b1$$uFZJ
000044136 7001_ $$0P:(DE-Juel1)VDB4964$$aCarius, R.$$b2$$uFZJ
000044136 7001_ $$0P:(DE-Juel1)VDB5911$$aWagner, H.$$b3$$uFZJ
000044136 7001_ $$0P:(DE-Juel1)VDB5925$$aStutzmann, M.$$b4$$uFZJ
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000044136 9141_ $$y2001
000044136 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000044136 9201_ $$0I:(DE-Juel1)VDB46$$d31.12.2006$$gIPV$$kIPV$$lInstitut für Photovoltaik$$x0
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