Journal Article

PreJuSER-44136

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications

Klein, S.FZJ* ; Finger, F.FZJ* ; Carius, R.FZJ* ; Wagner, H.FZJ* ; Stutzmann, M.FZJ*

2001
Elsevier Amsterdam [u.a.]

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Please use a persistent id in citations: doi:10.1016/S0040-6090(01)01280-9

Abstract: The influence of various deposition parameters on the electrical and optical properties and the structure of amorphous and microcrystalline silicon films was investigated for material prepared by hot-wire (HW) CVD in a new multichamber deposition system, designed for the development of thin film solar cells. Prior to the material studies, careful measurement of the real substrate temperature under the influence of additional HW heating was performed. While good electronic quality and solar cell performance was found for a-Si:H layers, the Lc-Si:H material showed very high spin densities, porosity and a characteristic structural inhomogeneity along the growth axis. (C) 2001 Elsevier Science B.V. All rights reserved.

Keyword(s): J ; hot-wire CVD (auto) ; structural properties (auto) ; solar cells (auto) ; silicon (auto)

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Institut für Photovoltaik (IPV)
2. Abteilung Sicherheit und Strahlenschutz (S)

Research Program(s):

1. Grundlagen und Technologie von Dünnschichtsolarzellen (30.90.0)

Appears in the scientific report 2001

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