TY  - JOUR
AU  - Klein, S.
AU  - Finger, F.
AU  - Carius, R.
AU  - Wagner, H.
AU  - Stutzmann, M.
TI  - Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications
JO  - Thin solid films
VL  - 395
SN  - 0040-6090
CY  - Amsterdam [u.a.]
PB  - Elsevier
M1  - PreJuSER-44136
SP  - 305 - 309
PY  - 2001
N1  - Record converted from VDB: 12.11.2012
AB  - The influence of various deposition parameters on the electrical and optical properties and the structure of amorphous and microcrystalline silicon films was investigated for material prepared by hot-wire (HW) CVD in a new multichamber deposition system, designed for the development of thin film solar cells. Prior to the material studies, careful measurement of the real substrate temperature under the influence of additional HW heating was performed. While good electronic quality and solar cell performance was found for a-Si:H layers, the Lc-Si:H material showed very high spin densities, porosity and a characteristic structural inhomogeneity along the growth axis. (C) 2001 Elsevier Science B.V. All rights reserved.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000171625000064
DO  - DOI:10.1016/S0040-6090(01)01280-9
UR  - https://juser.fz-juelich.de/record/44136
ER  -