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@ARTICLE{Klein:44136,
author = {Klein, S. and Finger, F. and Carius, R. and Wagner, H. and
Stutzmann, M.},
title = {{I}ntrinsic amorphous and microcrystalline silicon by
hot-wire-deposition for thin film solar cell applications},
journal = {Thin solid films},
volume = {395},
issn = {0040-6090},
address = {Amsterdam [u.a.]},
publisher = {Elsevier},
reportid = {PreJuSER-44136},
pages = {305 - 309},
year = {2001},
note = {Record converted from VDB: 12.11.2012},
abstract = {The influence of various deposition parameters on the
electrical and optical properties and the structure of
amorphous and microcrystalline silicon films was
investigated for material prepared by hot-wire (HW) CVD in a
new multichamber deposition system, designed for the
development of thin film solar cells. Prior to the material
studies, careful measurement of the real substrate
temperature under the influence of additional HW heating was
performed. While good electronic quality and solar cell
performance was found for a-Si:H layers, the Lc-Si:H
material showed very high spin densities, porosity and a
characteristic structural inhomogeneity along the growth
axis. (C) 2001 Elsevier Science B.V. All rights reserved.},
keywords = {J (WoSType)},
cin = {IPV / S / S},
ddc = {070},
cid = {I:(DE-Juel1)VDB46 / I:(DE-Juel1)VDB224 /
I:(DE-Juel1)VDB224},
pnm = {Grundlagen und Technologie von Dünnschichtsolarzellen},
pid = {G:(DE-Juel1)FUEK70},
shelfmark = {Materials Science, Multidisciplinary / Materials Science,
Coatings $\&$ Films / Physics, Applied / Physics, Condensed
Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000171625000064},
doi = {10.1016/S0040-6090(01)01280-9},
url = {https://juser.fz-juelich.de/record/44136},
}