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@ARTICLE{Soni:4668,
author = {Soni, R. and Meier, M. and Rüdiger, A. and Holländer, B.
and Kügeler, C. and Waser, R.},
title = {{I}ntegration of $\"{G}ex{S}e1-x\"$ in crossbar arrays for
non-volatile memory applications},
journal = {Microelectronic engineering},
volume = {86},
issn = {0167-9317},
address = {[S.l.] @},
publisher = {Elsevier},
reportid = {PreJuSER-4668},
pages = {1054 - 1056},
year = {2009},
note = {Record converted from VDB: 12.11.2012},
abstract = {This work presents the characterization of crossbar arrays
and cross-point structures with Cu containing Ge0.3Se0.7 and
SiOx buffer layer stack as an active material sandwiched
between an inert Pt bottom and an oxidizable Cu top
electrode. Essential characteristics for the future
non-volatile memories including high R-off/R-on ratio of
similar to 10(4) high retention ability at elevated
temperature and sufficient endurance up to 5 x 10(3) cycles
are presented. The possibility to write the memory cells
with few nA is promising for low power consumption
applications. (C) 2009 Elsevier B.V. All rights reserved.},
keywords = {J (WoSType)},
cin = {IBN-1 / IFF-6 / JARA-FIT},
ddc = {620},
cid = {I:(DE-Juel1)VDB799 / I:(DE-Juel1)VDB786 /
$I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Engineering, Electrical $\&$ Electronic / Nanoscience $\&$
Nanotechnology / Optics / Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000267273300156},
doi = {10.1016/j.mee.2009.01.010},
url = {https://juser.fz-juelich.de/record/4668},
}