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@ARTICLE{Guo:49699,
      author       = {Guo, X. and Vasco, E. and Mi, S. and Szot, K. and Wachsman,
                      E. and Waser, R.},
      title        = {{I}onic conduction in zirconia films on nanometer
                      thickness},
      journal      = {Acta materialia},
      volume       = {53},
      issn         = {1359-6454},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {PreJuSER-49699},
      pages        = {5161},
      year         = {2005},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Polycrystalline 8 $mol\%$ Y2O3-stabilized ZrO2 films with
                      thicknesses of 12 and 25 nm were deposited on (100) MgO
                      substrates, their nanostructures were investigated by means
                      of transmission electron microscopy (TEM), high-resolution
                      TEM and atomic force microscopy, and the electrical
                      properties of the nanostructured films were characterized in
                      dry and humid O-2. Compared with microcrystalline bulk
                      ceramics, the ionic conductivity of the nanostructured films
                      is lower by about a factor of 4, which is mainly due to the
                      lower bulk conductivity and the low grain-boundary
                      conductivity. There is not remarkable proton conduction in
                      the nanostructured films when annealed in water vapor, and
                      the influence of the ZrO2/MgO interface on its ionic
                      conduction is negligible. (c) 2005 Acta Materialia Inc.
                      Published by Elsevier Ltd. All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {IFF-IEM},
      ddc          = {670},
      cid          = {I:(DE-Juel1)VDB321},
      pnm          = {Kondensierte Materie},
      pid          = {G:(DE-Juel1)FUEK242},
      shelfmark    = {Materials Science, Multidisciplinary / Metallurgy $\&$
                      Metallurgical Engineering},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000232859000020},
      doi          = {10.1016/j.actamat.2005.07.033},
      url          = {https://juser.fz-juelich.de/record/49699},
}