001     49732
005     20180211190334.0
024 7 _ |2 DOI
|a 10.1016/j.tsf.2004.08.087
024 7 _ |2 WOS
|a WOS:000226169800024
037 _ _ |a PreJuSER-49732
041 _ _ |a eng
082 _ _ |a 070
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Materials Science, Coatings & Films
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Moert, M.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Integration of stacked capacitor module with ultra-thin ferroelectric SrBi2Ta2O9film for high density ferroelectric random access memory applications at low voltage operation
260 _ _ |a Amsterdam [u.a.]
|b Elsevier
|c 2005
300 _ _ |a 328
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Thin Solid Films
|x 0040-6090
|0 5762
|v 473
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The crystallization route of thin SrBi2Ta2O9 (SBT) films deposited on Pt(100 run)/Ti(10 nm)/SiO2/Si substrate is investigated at different annealing temperatures by atomic force microscopy (AFM) and X-ray diffractometry (XRD). To evaluate the SBT film properties for low voltage operation and for high storage density (> 16 MBit), SBT is deposited at different film thicknesses. Furthermore, the performance of a Pt/SBT/Pt capacitor on a banier-/contact-layer/polysilicon-plug architecture suitable for stacked capacitor memories is investigated by transmission electron microscopy (TEM)/energy dispersive X-ray analysis (EDX) and electrical measurements. It is shown that an oxidized and highly resistive contact layer can be recovered by electrical pulses. Finally, a process solution for a successful integration of 38 nm thin SBT films into this structure is provided. Published by Elsevier B.V.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|c I01
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK252
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a ferroelectric properties
653 2 0 |2 Author
|a crystallization
653 2 0 |2 Author
|a electrical properties and measurements
653 2 0 |2 Author
|a strontium bismuth tantalate (SBT)
700 1 _ |a Mikolajick, T.
|b 1
|0 P:(DE-HGF)0
700 1 _ |a Schindler, G.
|b 2
|0 P:(DE-HGF)0
700 1 _ |a Nagel, D. R.
|b 3
|0 P:(DE-HGF)0
700 1 _ |a Kasko, I.
|b 4
|0 P:(DE-HGF)0
700 1 _ |a Hartner, W.
|b 5
|0 P:(DE-HGF)0
700 1 _ |a Dehm, C.
|b 6
|0 P:(DE-HGF)0
700 1 _ |a Kohlstedt, H.
|b 7
|u FZJ
|0 P:(DE-Juel1)VDB3107
700 1 _ |a Waser, R.
|b 8
|u FZJ
|0 P:(DE-Juel1)131022
773 _ _ |a 10.1016/j.tsf.2004.08.087
|g Vol. 473, p. 328
|p 328
|q 473<328
|0 PERI:(DE-600)1482896-0
|t Thin solid films
|v 473
|y 2005
|x 0040-6090
856 7 _ |u http://dx.doi.org/10.1016/j.tsf.2004.08.087
909 C O |o oai:juser.fz-juelich.de:49732
|p VDB
913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
|b Information
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|x 0
914 1 _ |y 2005
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k IFF-IEM
|l Elektronische Materialien
|d 31.12.2006
|g IFF
|0 I:(DE-Juel1)VDB321
|x 0
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
|g CNI
|z 381
|0 I:(DE-Juel1)VDB381
|x 1
970 _ _ |a VDB:(DE-Juel1)77781
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980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB381


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