%0 Journal Article
%A Milanov, A.
%A Bhakta, R.
%A Thomas, R.
%A Ehrhart, P.
%A Winter, M.
%A Waser, R.
%A Devi, A.
%T Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
%J Journal of materials chemistry
%V 16
%@ 0959-9428
%C London
%I ChemSoc
%M PreJuSER-50084
%P 437
%D 2006
%Z Record converted from VDB: 12.11.2012
%X The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth Of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000235284100002
%R 10.1039/b509380e
%U https://juser.fz-juelich.de/record/50084