Journal Article

PreJuSER-50084

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

Milanov, A. ; Bhakta, R. ; Thomas, R.FZJ* ; Ehrhart, P.FZJ* ; Winter, M. ; Waser, R.FZJ* ; Devi, A.

2006
ChemSoc London

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Please use a persistent id in citations: doi:10.1039/b509380e

Abstract: The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth Of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition.

Keyword(s): J

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Elektronische Materialien (IFF-IEM)
2. Center of Nanoelectronic Systems for Information Technology (CNI)
3. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)

Research Program(s):

1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2006

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