TY  - JOUR
AU  - Milanov, A.
AU  - Bhakta, R.
AU  - Thomas, R.
AU  - Ehrhart, P.
AU  - Winter, M.
AU  - Waser, R.
AU  - Devi, A.
TI  - Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
JO  - Journal of materials chemistry
VL  - 16
SN  - 0959-9428
CY  - London
PB  - ChemSoc
M1  - PreJuSER-50084
SP  - 437
PY  - 2006
N1  - Record converted from VDB: 12.11.2012
AB  - The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth Of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000235284100002
DO  - DOI:10.1039/b509380e
UR  - https://juser.fz-juelich.de/record/50084
ER  -