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@ARTICLE{Milanov:50084,
      author       = {Milanov, A. and Bhakta, R. and Thomas, R. and Ehrhart, P.
                      and Winter, M. and Waser, R. and Devi, A.},
      title        = {{M}ixed amide-malonate compound of hafnium as a novel
                      monomeric precursor for {MOCVD} of {H}f{O}2 thin films},
      journal      = {Journal of materials chemistry},
      volume       = {16},
      issn         = {0959-9428},
      address      = {London},
      publisher    = {ChemSoc},
      reportid     = {PreJuSER-50084},
      pages        = {437},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {The concept of introducing malonates as chelating ligands
                      in combination with metal amides has yielded a new class of
                      compounds which enable growth Of HfO2 thin films at low
                      deposition temperatures by liquid injection metalorganic
                      chemical vapour deposition.},
      keywords     = {J (WoSType)},
      cin          = {IFF-IEM / CNI / JARA-FIT},
      ddc          = {540},
      cid          = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381 /
                      $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Chemistry, Physical / Materials Science, Multidisciplinary},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000235284100002},
      doi          = {10.1039/b509380e},
      url          = {https://juser.fz-juelich.de/record/50084},
}