| Home > Publications database > Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films > print |
| 001 | 50084 | ||
| 005 | 20180211181758.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1039/b509380e |
| 024 | 7 | _ | |2 WOS |a WOS:000235284100002 |
| 037 | _ | _ | |a PreJuSER-50084 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 540 |
| 084 | _ | _ | |2 WoS |a Chemistry, Physical |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 100 | 1 | _ | |a Milanov, A. |b 0 |0 P:(DE-HGF)0 |
| 245 | _ | _ | |a Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films |
| 260 | _ | _ | |a London |b ChemSoc |c 2006 |
| 300 | _ | _ | |a 437 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Journal of Materials Chemistry |x 0959-9428 |0 13161 |y 5 |v 16 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth Of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition. |
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| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 700 | 1 | _ | |a Bhakta, R. |b 1 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Thomas, R. |b 2 |u FZJ |0 P:(DE-Juel1)VDB35139 |
| 700 | 1 | _ | |a Ehrhart, P. |b 3 |u FZJ |0 P:(DE-Juel1)VDB3072 |
| 700 | 1 | _ | |a Winter, M. |b 4 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Waser, R. |b 5 |u FZJ |0 P:(DE-Juel1)131022 |
| 700 | 1 | _ | |a Devi, A. |b 6 |0 P:(DE-HGF)0 |
| 773 | _ | _ | |a 10.1039/b509380e |g Vol. 16, p. 437 |p 437 |q 16<437 |0 PERI:(DE-600)1491403-7 |t Journal of materials chemistry |v 16 |y 2006 |x 0959-9428 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1039/b509380e |
| 909 | C | O | |o oai:juser.fz-juelich.de:50084 |p VDB |
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| 914 | 1 | _ | |y 2006 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |d 31.12.2006 |g IFF |k IFF-IEM |l Elektronische Materialien |0 I:(DE-Juel1)VDB321 |x 0 |
| 920 | 1 | _ | |d 14.09.2008 |g CNI |k CNI |l Center of Nanoelectronic Systems for Information Technology |0 I:(DE-Juel1)VDB381 |x 1 |z 381 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 2 |
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| 980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 980 | _ | _ | |a I:(DE-Juel1)VDB381 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a UNRESTRICTED |
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