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005     20180211181758.0
024 7 _ |2 DOI
|a 10.1039/b509380e
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037 _ _ |a PreJuSER-50084
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Chemistry, Physical
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
100 1 _ |a Milanov, A.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films
260 _ _ |a London
|b ChemSoc
|c 2006
300 _ _ |a 437
336 7 _ |a Journal Article
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336 7 _ |a article
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440 _ 0 |a Journal of Materials Chemistry
|x 0959-9428
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|v 16
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The concept of introducing malonates as chelating ligands in combination with metal amides has yielded a new class of compounds which enable growth Of HfO2 thin films at low deposition temperatures by liquid injection metalorganic chemical vapour deposition.
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
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700 1 _ |a Bhakta, R.
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700 1 _ |a Thomas, R.
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700 1 _ |a Ehrhart, P.
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700 1 _ |a Winter, M.
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700 1 _ |a Waser, R.
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700 1 _ |a Devi, A.
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773 _ _ |a 10.1039/b509380e
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|0 PERI:(DE-600)1491403-7
|t Journal of materials chemistry
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|y 2006
|x 0959-9428
856 7 _ |u http://dx.doi.org/10.1039/b509380e
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914 1 _ |y 2006
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920 1 _ |d 31.12.2006
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