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000051241 084__ $$2WoS$$aNanoscience & Nanotechnology
000051241 1001_ $$0P:(DE-Juel1)VDB34541$$aKronholz, S.$$b0$$uFZJ
000051241 245__ $$aMetallic Nanogaps with Access Windows for Liquid-based Systems
000051241 260__ $$aAmsterdam [u.a.]$$bElsevier Science$$c2006
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000051241 520__ $$aA new method has been established for the reproducible fabrication of high quality, metallic nanogaps on silicon chips suitable for liquid based nanometer scale devices. Realization of mu m structures connected to nanogaps with gap sizes down to 30 nm has been achieved by a combination of an optical and an electron-beam (e-beam) lithography step using an optimised adhesion layer/metallic layer combination (Ti/Pt/Au-three layer combination) and an adopted two layer e-beam resist. The quality of the interconnects between optically and e-beam lithographically defined structures and the surface roughness of the gold nanogaps have been improved by a controlled temperature treatment. With this method the production of a variety of different gap shapes could be demonstrated. Specifically the lithographic structures have been successfully covered by a protection layer, except of a 200 nm x 400 nm size access window located on top of the nanogaps, making it suitable for applications in liquid environment such as molecular and/or electrochemical metal deposition. (C) 2005 Elsevier Ltd. All rights reserved.
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000051241 65320 $$2Author$$aaccess window
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000051241 7001_ $$0P:(DE-Juel1)130751$$aKarthäuser, S.$$b1$$uFZJ
000051241 7001_ $$0P:(DE-Juel1)VDB5570$$avan der Hart, A.$$b2$$uFZJ
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