001     52768
005     20190625110301.0
024 7 _ |2 DOI
|a 10.1016/j.sse.2004.07.002
024 7 _ |2 WOS
|a WOS:000225719100012
024 7 _ |a altmetric:1245179
|2 altmetric
037 _ _ |a PreJuSER-52768
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Engineering, Electrical & Electronic
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Knoch, J.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB56683
245 _ _ |a Comparison of transport properties in carbon nanotube field-effect transistors with Schottky contacts and doped source/drain contacts
260 _ _ |a Oxford [u.a.]
|b Pergamon, Elsevier Science
|c 2005
300 _ _ |a 73 - 76
336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
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336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
|2 DRIVER
440 _ 0 |a Solid-State Electronics
|x 0038-1101
|0 6634
|v 49
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a In this Letter, we present a simulation study of the electrical characteristics of ultimately scaled carbon nanotube field-effect transistors. Devices with Schottky contacts and doped source/drain contacts are compared. We show that for small bias devices with doped source/drain contacts exhibit a better on- as well as off-state compared to devices with Schottky contacts. Both device types, however, show a poor off-state for larger bias. We will discuss the relevant transport mechanisms involved and explain our observations. (C) 2004 Elsevier Ltd. All rights reserved.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|c I01
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK252
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588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a carbon nanotubes
653 2 0 |2 Author
|a field-effect transistor
653 2 0 |2 Author
|a Schottky contacts
653 2 0 |2 Author
|a electronic transport
700 1 _ |a Mantl, S.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB4959
700 1 _ |a Appenzeller, J.
|b 2
|0 P:(DE-HGF)0
773 _ _ |a 10.1016/j.sse.2004.07.002
|g Vol. 49, p. 73 - 76
|p 73 - 76
|q 49<73 - 76
|0 PERI:(DE-600)2012825-3
|t Solid state electronics
|v 49
|y 2005
|x 0038-1101
856 7 _ |u http://dx.doi.org/10.1016/j.sse.2004.07.002
909 C O |o oai:juser.fz-juelich.de:52768
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913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
|b Information
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|x 0
914 1 _ |a Nachtrag
|y 2005
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k ISG-1
|l Institut für Halbleiterschichten und Bauelemente
|d 31.12.2006
|g ISG
|0 I:(DE-Juel1)VDB41
|x 0
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
|g CNI
|z 381
|0 I:(DE-Juel1)VDB381
|x 1
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981 _ _ |a I:(DE-Juel1)PGI-9-20110106
981 _ _ |a I:(DE-Juel1)VDB381


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