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@ARTICLE{Lin:52769,
author = {Lin, Y. and Appenzeller, J. and Knoch, J. and Avouris, P.},
title = {{H}igh-{P}erformance {C}arbon {N}anotube {F}ield-{E}ffect
{T}ransistor {W}ith {T}unable {P}olarities},
journal = {IEEE transactions on nanotechnology},
volume = {4},
issn = {1536-125X},
address = {New York, NY},
publisher = {IEEE},
reportid = {PreJuSER-52769},
pages = {481 - 489},
year = {2005},
note = {Record converted from VDB: 12.11.2012},
abstract = {State-of-the-art carbon nanotube field-effect transistors
(CNFETs) behave as Schottky-barrier-modulated transistors.
It is known that vertical scaling of the gate oxide
significantly improves the performance of these devices.
However, decreasing the oxide thickness also results in
pronounced ambipolar transistor characteristics and
increased drain leakage currents. Using a novel device
concept, we have fabricated high-performance
enhancement-mode CNFETs exhibiting n- or p-type unipolar
behavior, tunable by electrostatic and/or chemical doping,
with excellent OFF-State performance and a steep
subthreshold swing (S = 63 mV/dec). The device design allows
for aggressive oxide thickness and gate-length scaling while
maintaining the desired device characteristics.},
keywords = {J (WoSType)},
cin = {ISG-1 / CNI},
ddc = {530},
cid = {I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB381},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Engineering, Electrical $\&$ Electronic / Nanoscience $\&$
Nanotechnology / Materials Science, Multidisciplinary /
Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000231809500001},
doi = {10.1109/TNANO.2005.851427},
url = {https://juser.fz-juelich.de/record/52769},
}