% IMPORTANT: The following is UTF-8 encoded.  This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.

@ARTICLE{Spieker:53406,
      author       = {Spieker, E. and Hollensteiner, S. and Jäger, W. and
                      Haselier, H. and Schroeder, H.},
      title        = {{S}elf-assembled nanostructures on {VS}e2 surfaces induced
                      by {C}u deposition},
      journal      = {Microscopy and microanalysis},
      volume       = {11},
      issn         = {1431-9276},
      address      = {New York, NY},
      publisher    = {Cambridge University Press},
      reportid     = {PreJuSER-53406},
      pages        = {456 - 471},
      year         = {2005},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Analytical transmission electron microscopy (TEM) and
                      scanning electron microscopy (SEM) have been applied for the
                      characterization of evolution, lateral arrangements,
                      orientations, and the microscopic nature of nanostructures
                      formed during the early stages of ultrahigh vacuum electron
                      beam evaporation of Cu onto surfaces of VSe2 layered
                      crystals. Linear nanostructure of relatively large lateral
                      dimension (100-500 nm) and networks of smaller
                      nanostructures (lateral dimension: 15-30 nm; mesh sizes:
                      500-2000 nm) are subsequently formed on the substrate
                      surfaces. Both types of nanostructures are not Cu nanowires
                      but are composed of two strands of crystalline substrate
                      material elevating above the substrate surface. For the
                      large nanostructures a symmetric roof structure with an
                      inclination angle of approximately 30 degrees with respect
                      to the substrate surface could be deduced from detailed
                      diffraction contrast experiments. In addition to the
                      nanostructure networks a thin layer of a Cu-VSe2
                      intercalation phase of 3R polytype is observed at the
                      substrate surface. A dense network of interface dislocations
                      indicates that the phase formation is accompanied by
                      in-plane strain. We present a model that explains the
                      formation of large and small nanostructures as consequences
                      of compressive layer strains that are relaxed by the
                      formation of rooflike nanostructures, finally evolving into
                      the observed networks with increasing deposition time. The
                      dominating contributions to the compressive layer strains
                      are considered to be an electronic charge transfer from the
                      Cu adsorbate to the substrate and the formation of a Cu-VSe2
                      intercalation compound in a thin surface layer.},
      keywords     = {J (WoSType)},
      cin          = {CNI / IFF-IEM},
      ddc          = {570},
      cid          = {I:(DE-Juel1)VDB381 / I:(DE-Juel1)VDB321},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Materials Science, Multidisciplinary / Microscopy},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {pmid:17481326},
      UT           = {WOS:000232378800008},
      doi          = {10.1017/S1431927605050373},
      url          = {https://juser.fz-juelich.de/record/53406},
}