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@ARTICLE{Tschersich:54465,
      author       = {Tschersich, K. G. and Littmark, U. and Beyer, W.},
      title        = {{A}djustable hydrogen atom incorporation into sputter
                      desposited a-{S}i{C}},
      journal      = {Thin solid films},
      volume       = {515},
      issn         = {0040-6090},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-54465},
      pages        = {464 - 467},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Thin films of a-Si0.8C0.2:H are deposited by ion beam
                      sputtering combined with the simultaneous irradiation of
                      hydrogen atoms delivered by a thermal hydrogen atom source.
                      Elemental composition and bonding structure of the films are
                      analysed by XPS, RBS, ERD, and FTIR. The hydrogen
                      concentration can be varied in a controlled manner. Up to
                      concentrations of $5\%,$ the hydrogen is exclusively
                      incorporated in single Si-H bonds. (c) 2005 Elsevier B.V.
                      All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {IPV / ISG-4},
      ddc          = {070},
      cid          = {I:(DE-Juel1)VDB46 / I:(DE-Juel1)VDB421},
      pnm          = {Erneuerbare Energien / Kondensierte Materie},
      pid          = {G:(DE-Juel1)FUEK401 / G:(DE-Juel1)FUEK414},
      shelfmark    = {Materials Science, Multidisciplinary / Materials Science,
                      Coatings $\&$ Films / Physics, Applied / Physics, Condensed
                      Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000241220600019},
      doi          = {10.1016/j.tsf.2005.12.296},
      url          = {https://juser.fz-juelich.de/record/54465},
}