| Home > Publications database > Adjustable hydrogen atom incorporation into sputter desposited a-SiC > print |
| 001 | 54465 | ||
| 005 | 20240708133720.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1016/j.tsf.2005.12.296 |
| 024 | 7 | _ | |2 WOS |a WOS:000241220600019 |
| 037 | _ | _ | |a PreJuSER-54465 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 070 |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Materials Science, Coatings & Films |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Tschersich, K. G. |b 0 |u FZJ |0 P:(DE-Juel1)VDB34109 |
| 245 | _ | _ | |a Adjustable hydrogen atom incorporation into sputter desposited a-SiC |
| 260 | _ | _ | |a Amsterdam [u.a.] |b Elsevier |c 2006 |
| 300 | _ | _ | |a 464 - 467 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Thin Solid Films |x 0040-6090 |0 5762 |v 515 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a Thin films of a-Si0.8C0.2:H are deposited by ion beam sputtering combined with the simultaneous irradiation of hydrogen atoms delivered by a thermal hydrogen atom source. Elemental composition and bonding structure of the films are analysed by XPS, RBS, ERD, and FTIR. The hydrogen concentration can be varied in a controlled manner. Up to concentrations of 5%, the hydrogen is exclusively incorporated in single Si-H bonds. (c) 2005 Elsevier B.V. All rights reserved. |
| 536 | _ | _ | |a Erneuerbare Energien |c P11 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK401 |x 0 |
| 536 | _ | _ | |a Kondensierte Materie |c P54 |0 G:(DE-Juel1)FUEK414 |x 1 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a amorphous materials |
| 653 | 2 | 0 | |2 Author |a sputtering |
| 653 | 2 | 0 | |2 Author |a hydrogen |
| 653 | 2 | 0 | |2 Author |a infrared spectroscopy |
| 700 | 1 | _ | |a Littmark, U. |b 1 |u FZJ |0 P:(DE-Juel1)VDB58263 |
| 700 | 1 | _ | |a Beyer, W. |b 2 |u FZJ |0 P:(DE-Juel1)VDB5907 |
| 773 | _ | _ | |a 10.1016/j.tsf.2005.12.296 |g Vol. 515, p. 464 - 467 |p 464 - 467 |q 515<464 - 467 |0 PERI:(DE-600)1482896-0 |t Thin solid films |v 515 |y 2006 |x 0040-6090 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1016/j.tsf.2005.12.296 |
| 909 | C | O | |o oai:juser.fz-juelich.de:54465 |p VDB |
| 913 | 1 | _ | |k P11 |v Erneuerbare Energien |l Erneuerbare Energien |b Energie |0 G:(DE-Juel1)FUEK401 |x 0 |
| 913 | 1 | _ | |k P54 |v Kondensierte Materie |l Kondensierte Materie |b Materie |z entfällt bis 2009 |0 G:(DE-Juel1)FUEK414 |x 1 |
| 914 | 1 | _ | |y 2006 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |k IPV |l Institut für Photovoltaik |d 31.12.2006 |g IPV |0 I:(DE-Juel1)VDB46 |x 0 |
| 920 | 1 | _ | |k ISG-4 |l Biologische Schichten |d 31.12.2006 |g ISG |0 I:(DE-Juel1)VDB421 |x 1 |
| 970 | _ | _ | |a VDB:(DE-Juel1)85286 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
| 980 | _ | _ | |a I:(DE-Juel1)ICS-7-20110106 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)IMD-3-20101013 |
| 981 | _ | _ | |a I:(DE-Juel1)IBI-2-20200312 |
| 981 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
| 981 | _ | _ | |a I:(DE-Juel1)ICS-7-20110106 |
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