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000005451 084__ $$2WoS$$aEngineering, Electrical & Electronic
000005451 084__ $$2WoS$$aPhysics, Applied
000005451 1001_ $$0P:(DE-Juel1)VDB59925$$aWeides, M.$$b0$$uFZJ
000005451 245__ $$aJosephson Junctions with Centred Step and Local Variation of Critical Current Density
000005451 260__ $$aNew York, NY$$bIEEE$$c2009
000005451 300__ $$a689 - 692
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000005451 440_0 $$02490$$aIEEE Transactions on Applied Superconductivity$$v19$$x1051-8223$$y3
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000005451 520__ $$aSuperconductor-insulator-ferromagnet-superconductor (SIFS) Josephson tunnel junctions based on Nb/Al2O3/NiCu/Nb stacks with a thickness step in the metallic NiCu interlayer were fabricated. The step height of a few 0.1 nm was defined by optical lithography and controlled etching of both Nb and NiCu layers. Experimentally determined junction parameters by current-voltage characteristics and Fraunhofer pattern indicate a uniform NiCu thickness and similar interface transparencies for etched and non-etched parts. The critical current diffraction pattern was calculated and measured for stepped junctions having the same ground phase difference but different critical current densities in both halves. The measured data show a good agreement with simulations.
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000005451 65320 $$2Author$$aFerromagnetic materials
000005451 65320 $$2Author$$aJosephson junctions
000005451 65320 $$2Author$$asuperconducting device fabrication
000005451 65320 $$2Author$$athin films
000005451 773__ $$0PERI:(DE-600)2025387-4$$a10.1109/TASC.2009.2019049$$gVol. 19, p. 689 - 692$$p689 - 692$$q19<689 - 692$$tIEEE transactions on applied superconductivity$$v19$$x1051-8223$$y2009
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