Home > Publications database > Josephson Junctions with Centred Step and Local Variation of Critical Current Density |
Journal Article | PreJuSER-5451 |
2009
IEEE
New York, NY
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Please use a persistent id in citations: doi:10.1109/TASC.2009.2019049
Abstract: Superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson tunnel junctions based on Nb/Al2O3/NiCu/Nb stacks with a thickness step in the metallic NiCu interlayer were fabricated. The step height of a few 0.1 nm was defined by optical lithography and controlled etching of both Nb and NiCu layers. Experimentally determined junction parameters by current-voltage characteristics and Fraunhofer pattern indicate a uniform NiCu thickness and similar interface transparencies for etched and non-etched parts. The critical current diffraction pattern was calculated and measured for stepped junctions having the same ground phase difference but different critical current densities in both halves. The measured data show a good agreement with simulations.
Keyword(s): J ; Ferromagnetic materials (auto) ; Josephson junctions (auto) ; superconducting device fabrication (auto) ; thin films (auto)
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