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001 | 5451 | ||
005 | 20180208214537.0 | ||
024 | 7 | _ | |2 DOI |a 10.1109/TASC.2009.2019049 |
024 | 7 | _ | |2 WOS |a WOS:000268282000130 |
037 | _ | _ | |a PreJuSER-5451 |
041 | _ | _ | |a eng |
082 | _ | _ | |a 530 |
084 | _ | _ | |2 WoS |a Engineering, Electrical & Electronic |
084 | _ | _ | |2 WoS |a Physics, Applied |
100 | 1 | _ | |a Weides, M. |b 0 |u FZJ |0 P:(DE-Juel1)VDB59925 |
245 | _ | _ | |a Josephson Junctions with Centred Step and Local Variation of Critical Current Density |
260 | _ | _ | |a New York, NY |b IEEE |c 2009 |
300 | _ | _ | |a 689 - 692 |
336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
336 | 7 | _ | |a ARTICLE |2 BibTeX |
336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
336 | 7 | _ | |a article |2 DRIVER |
440 | _ | 0 | |a IEEE Transactions on Applied Superconductivity |x 1051-8223 |0 2490 |y 3 |v 19 |
500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
520 | _ | _ | |a Superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson tunnel junctions based on Nb/Al2O3/NiCu/Nb stacks with a thickness step in the metallic NiCu interlayer were fabricated. The step height of a few 0.1 nm was defined by optical lithography and controlled etching of both Nb and NiCu layers. Experimentally determined junction parameters by current-voltage characteristics and Fraunhofer pattern indicate a uniform NiCu thickness and similar interface transparencies for etched and non-etched parts. The critical current diffraction pattern was calculated and measured for stepped junctions having the same ground phase difference but different critical current densities in both halves. The measured data show a good agreement with simulations. |
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588 | _ | _ | |a Dataset connected to Web of Science |
650 | _ | 7 | |a J |2 WoSType |
653 | 2 | 0 | |2 Author |a Ferromagnetic materials |
653 | 2 | 0 | |2 Author |a Josephson junctions |
653 | 2 | 0 | |2 Author |a superconducting device fabrication |
653 | 2 | 0 | |2 Author |a thin films |
773 | _ | _ | |a 10.1109/TASC.2009.2019049 |g Vol. 19, p. 689 - 692 |p 689 - 692 |q 19<689 - 692 |0 PERI:(DE-600)2025387-4 |t IEEE transactions on applied superconductivity |v 19 |y 2009 |x 1051-8223 |
856 | 7 | _ | |u http://dx.doi.org/10.1109/TASC.2009.2019049 |
909 | C | O | |o oai:juser.fz-juelich.de:5451 |p VDB |
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914 | 1 | _ | |y 2009 |
915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
920 | 1 | _ | |k IFF-6 |l Elektronische Materialien |d 31.12.2010 |g IFF |0 I:(DE-Juel1)VDB786 |x 0 |
970 | _ | _ | |a VDB:(DE-Juel1)112987 |
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980 | _ | _ | |a UNRESTRICTED |
981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
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