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024 7 _ |a 10.1063/1.2178771
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024 7 _ |a 2128/18017
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037 _ _ |a PreJuSER-57838
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Mahalingam, K.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Quantifying stoichiometry of mixed-cation-anion III-V semiconductor interfaces at atomic resolution
260 _ _ |a Melville, NY
|b American Institute of Physics
|c 2006
300 _ _ |a 091904
336 7 _ |a Journal Article
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336 7 _ |a article
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440 _ 0 |a Applied Physics Letters
|x 0003-6951
|0 562
|v 88
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Employing the focal-series reconstruction technique in high-resolution transmission electron microscopy, we obtained true atomic resolution images of interfacial disorder within cation and anion sublattices across interfaces in an InGaSb/InAs heterostructure. This enabled independent quantitative mapping of changes in the In-Ga and As-Sb contents across interfacial regions similar to 0.6 nm in width. A comparison of the cation and anion sublattice images revealed that intermixing at the InGaSb-on-InAs interface is confined to the In-Ga sublattice. Also, atomic scale roughness within the As-Sb sublattice of the InAs-on-InGaSb interface was discerned. This approach is general, permitting atomic-scale compositional analysis of heterointerfaces with two species per sublattice. (c) 2006 American Institute of Physics.
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700 1 _ |a Eyink, K. G.
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700 1 _ |a Brown, G. J.
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700 1 _ |a Dorsey, D. L.
|b 3
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700 1 _ |a Kisielowski, C. F.
|b 4
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700 1 _ |a Thust, A.
|b 5
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773 _ _ |a 10.1063/1.2178771
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|t Applied physics letters
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|x 0003-6951
856 7 _ |u http://dx.doi.org/10.1063/1.2178771
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