%0 Journal Article
%A Kever, T.
%A Nauenheim, C.
%A Böttger, U.
%A Waser, R.
%T Preparation and characterisation of amorphous Cu: 7,7,8,8-Tetracyanoquinodimethane thin films with low surface roughness via thermal co-deposition
%J Thin solid films
%V 515
%@ 0040-6090
%C Amsterdam [u.a.]
%I Elsevier
%M PreJuSER-58048
%P 1893 - 1896
%D 2006
%Z Record converted from VDB: 12.11.2012
%X We demonstrate a physical vapor deposition process for preparing amorphous Cu:Tetracyanoquinodimethane (Cu:TCNQ) thin films. Samples made by this co-evaporation process exhibit a smooth surface in the scanning electron microscope. Spectroscopic studies confirmed the formation of a charge transfer (CT) complex with a degree of CT of 0.68. Reproducible resistive switching is observed in a glass/NiCr/Al/Cu:TCNQ/Al sandwich structure. OFF/ON ratios of 10 to 10(2) and impedance values between 100 k Omega and 10 M Omega have been measured. Switching voltages for the prepared samples with a film thickness of around 100 run are in the range of 4 +/- 2 V and are fairly symmetrical. The devices have a life time of more than 10(4) switching cycles. (c) 2006 Elsevier B.V. All rights reserved.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000242931900105
%R 10.1016/j.tsf.2006.07.028
%U https://juser.fz-juelich.de/record/58048