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| Home > Publications database > Preparation and characterisation of amorphous Cu: 7,7,8,8-Tetracyanoquinodimethane thin films with low surface roughness via thermal co-deposition > print |
| Home > Publications database > Preparation and characterisation of amorphous Cu: 7,7,8,8-Tetracyanoquinodimethane thin films with low surface roughness via thermal co-deposition > print |
| 001 | 58048 | ||
| 005 | 20180211173302.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1016/j.tsf.2006.07.028 |
| 024 | 7 | _ | |2 WOS |a WOS:000242931900105 |
| 037 | _ | _ | |a PreJuSER-58048 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 070 |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Materials Science, Coatings & Films |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Kever, T. |b 0 |0 P:(DE-HGF)0 |
| 245 | _ | _ | |a Preparation and characterisation of amorphous Cu: 7,7,8,8-Tetracyanoquinodimethane thin films with low surface roughness via thermal co-deposition |
| 260 | _ | _ | |a Amsterdam [u.a.] |b Elsevier |c 2006 |
| 300 | _ | _ | |a 1893 - 1896 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Thin Solid Films |x 0040-6090 |0 5762 |v 515 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a We demonstrate a physical vapor deposition process for preparing amorphous Cu:Tetracyanoquinodimethane (Cu:TCNQ) thin films. Samples made by this co-evaporation process exhibit a smooth surface in the scanning electron microscope. Spectroscopic studies confirmed the formation of a charge transfer (CT) complex with a degree of CT of 0.68. Reproducible resistive switching is observed in a glass/NiCr/Al/Cu:TCNQ/Al sandwich structure. OFF/ON ratios of 10 to 10(2) and impedance values between 100 k Omega and 10 M Omega have been measured. Switching voltages for the prepared samples with a film thickness of around 100 run are in the range of 4 +/- 2 V and are fairly symmetrical. The devices have a life time of more than 10(4) switching cycles. (c) 2006 Elsevier B.V. All rights reserved. |
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| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a resistive switching |
| 653 | 2 | 0 | |2 Author |a amorphous materials |
| 653 | 2 | 0 | |2 Author |a physical vapor deposition |
| 653 | 2 | 0 | |2 Author |a scanning electron microscopy |
| 700 | 1 | _ | |a Nauenheim, C. |b 1 |u FZJ |0 P:(DE-Juel1)VDB61380 |
| 700 | 1 | _ | |a Böttger, U. |b 2 |u FZJ |0 P:(DE-Juel1)VDB3024 |
| 700 | 1 | _ | |a Waser, R. |b 3 |u FZJ |0 P:(DE-Juel1)131022 |
| 773 | _ | _ | |a 10.1016/j.tsf.2006.07.028 |g Vol. 515, p. 1893 - 1896 |p 1893 - 1896 |q 515<1893 - 1896 |0 PERI:(DE-600)1482896-0 |t Thin solid films |v 515 |y 2006 |x 0040-6090 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1016/j.tsf.2006.07.028 |
| 909 | C | O | |o oai:juser.fz-juelich.de:58048 |p VDB |
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| 914 | 1 | _ | |a Nachtrag |y 2006 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
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