001     58275
005     20180211163827.0
024 7 _ |2 DOI
|a 10.1088/0960-1317/17/9/006
024 7 _ |2 WOS
|a WOS:000249222400017
037 _ _ |a PreJuSER-58275
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Engineering, Electrical & Electronic
084 _ _ |2 WoS
|a Nanoscience & Nanotechnology
084 _ _ |2 WoS
|a Instruments & Instrumentation
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Mechanics
100 1 _ |a Yang, Z.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a A new test facility for efficient evaluation of MEMS contact materials
260 _ _ |a Bristol
|b Inst.
|c 2007
300 _ _ |a 1788
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Journal of Micromechanics and Microengineering
|x 0960-1317
|0 17721
|v 17
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a A novel test facility for the efficient evaluation of microelectromechanical system ( MEMS) switches and the development of alternative contact materials is described. The facility utilizes the upper cantilever from commercial MEMS contact switches, and tests these against alternative bottom contact materials within a modified atomic force microscope ( AFM). The test closely approximates the real switch, but can accommodate a wider range of test conditions and contact materials. The facility allows alternative contact materials to be easily and quickly incorporated, and therefore evaluated by measuring the number of cycles to failure. The evolution of the wear surfaces of the switch contact materials under test can also be easily examined. In order to demonstrate the facility, the evolution of the contact resistance and wear of a commercial RF MEMS cantilever with Au contacts was monitored under accelerated test conditions, comparing the behavior of Au bottom contacts to an alternative Au-Ni alloy contact material. The Au-Ni( 20 at.%) alloy displayed reduced wear rates and improved switch cycle lifetimes compared to pure Au, while retaining acceptable values of contact resistance.
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
|c P42
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK412
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
700 1 _ |a Lichtenwalner, D.
|b 1
|0 P:(DE-HGF)0
700 1 _ |a Morris, A.
|b 2
|0 P:(DE-HGF)0
700 1 _ |a Menzel, S.
|b 3
|0 P:(DE-HGF)0
700 1 _ |a Nauenheim, C.
|b 4
|u FZJ
|0 P:(DE-Juel1)VDB61380
700 1 _ |a Gruverman, A.
|b 5
|0 P:(DE-HGF)0
700 1 _ |a Krim, J.
|b 6
|0 P:(DE-HGF)0
700 1 _ |a Kingon, A.
|b 7
|0 P:(DE-HGF)0
773 _ _ |a 10.1088/0960-1317/17/9/006
|g Vol. 17, p. 1788
|p 1788
|q 17<1788
|0 PERI:(DE-600)1480280-6
|t Journal of micromechanics and microengineering
|v 17
|y 2007
|x 0960-1317
856 7 _ |u http://dx.doi.org/10.1088/0960-1317/17/9/006
909 C O |o oai:juser.fz-juelich.de:58275
|p VDB
913 1 _ |k P42
|v Grundlagen für zukünftige Informationstechnologien
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|b Schlüsseltechnologien
|0 G:(DE-Juel1)FUEK412
|x 0
914 1 _ |y 2007
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k IFF-6
|l Elektronische Materialien
|d 31.12.2010
|g IFF
|0 I:(DE-Juel1)VDB786
|x 0
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
|g CNI
|z 381
|0 I:(DE-Juel1)VDB381
|x 1
970 _ _ |a VDB:(DE-Juel1)91666
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-Juel1)PGI-7-20110106
980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB381


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