Home > Publications database > Microstructure characterization of amorphous silicon carbon (a-Si:C:H) films by hydrogen effusion and diffusion measurements > print |
001 | 60113 | ||
005 | 20240708133657.0 | ||
037 | _ | _ | |a PreJuSER-60113 |
100 | 1 | _ | |a Saleh, R. |0 P:(DE-HGF)0 |b 0 |
111 | 2 | _ | |c Singapore |d 2000-11-22 |
245 | _ | _ | |a Microstructure characterization of amorphous silicon carbon (a-Si:C:H) films by hydrogen effusion and diffusion measurements |
260 | _ | _ | |c 2000 |
295 | 1 | 0 | |a International Symposium on the Science on Surfaces and Nanostructures (ISSSN) |
336 | 7 | _ | |a Poster |0 PUB:(DE-HGF)24 |2 PUB:(DE-HGF) |
336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
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336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
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700 | 1 | _ | |a Munisa, L. |0 P:(DE-HGF)0 |b 1 |
700 | 1 | _ | |a Beyer, W. |0 P:(DE-Juel1)VDB5907 |b 2 |u FZJ |
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914 | 1 | _ | |y 2000 |
920 | 1 | _ | |k IPV |l Institut für Photovoltaik |d 31.12.2006 |g IPV |0 I:(DE-Juel1)VDB46 |x 0 |
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