TY  - JOUR
AU  - Kunkemöller, Georg
AU  - Maß, Tobias W. W.
AU  - Michel, Ann-Katrin U.
AU  - Kim, Hyun-Su
AU  - Brose, Sascha
AU  - Danylyuk, Serhiy
AU  - Taubner, Thomas
AU  - Juschkin, Larissa
TI  - Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
JO  - Optics express
VL  - 23
IS  - 20
SN  - 1094-4087
CY  - Washington, DC
PB  - Soc.
M1  - FZJ-2016-02283
SP  - 25487 -
PY  - 2015
AB  - We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000365077900008
DO  - DOI:10.1364/OE.23.025487
UR  - https://juser.fz-juelich.de/record/808641
ER  -