Journal Article

FZJ-2016-02283

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas

Kunkemöller, G. (Corresponding author) ; Maß, T. W. W. ; Michel, A. U. ; Kim, H.-S. ; Brose, S. ; Danylyuk, S. ; Taubner, T. ; Juschkin, L. (Corresponding author)FZJ*

2015
Soc. Washington, DC

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Please use a persistent id in citations: http://hdl.handle.net/2128/10752  doi:10.1364/OE.23.025487

Abstract: We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. JARA-FIT (JARA-FIT)
3. Rheinisch-Westfälische Technische Hochschule (RWTH)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016

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Database coverage:
; ; ; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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