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@ARTICLE{Kunkemller:808641,
      author       = {Kunkemöller, Georg and Maß, Tobias W. W. and Michel,
                      Ann-Katrin U. and Kim, Hyun-Su and Brose, Sascha and
                      Danylyuk, Serhiy and Taubner, Thomas and Juschkin, Larissa},
      title        = {{E}xtreme ultraviolet proximity lithography for fast,
                      flexible and parallel fabrication of infrared antennas},
      journal      = {Optics express},
      volume       = {23},
      number       = {20},
      issn         = {1094-4087},
      address      = {Washington, DC},
      publisher    = {Soc.},
      reportid     = {FZJ-2016-02283},
      pages        = {25487 -},
      year         = {2015},
      abstract     = {We present a method for fabrication of large arrays of
                      nano-antennas using extreme-ultraviolet (EUV) illumination.
                      A discharge-produced plasma source generating EUV radiation
                      around 10.88 nm wavelength is used for the illumination of a
                      photoresist via a mask in a proximity printing setup. The
                      method of metallic nanoantennas fabrication utilizes a
                      bilayer photoresist and employs a lift-off process. The
                      impact of Fresnel-diffraction of EUV light in the mask on a
                      shape of the nanostructures has been investigated. It is
                      shown how by the use of the same rectangular apertures in
                      the transmission mask, antennas of various shapes can be
                      fabricated. Using Fourier transform infrared spectroscopy,
                      spectra of antennas reflectivity were measured and compared
                      to FDTD simulations demonstrating good agreement.},
      cin          = {PGI-9 / JARA-FIT / RWTH},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$ /
                      I:(DE-588b)36225-6},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000365077900008},
      doi          = {10.1364/OE.23.025487},
      url          = {https://juser.fz-juelich.de/record/808641},
}