TY  - JOUR
AU  - Schmitz, Christoph
AU  - Wilson, Daniel
AU  - Rudolf, Denis
AU  - Wiemann, Carsten
AU  - Plucinski, Lukasz
AU  - Riess, Sally
AU  - Schuck, Martin
AU  - Hardtdegen, Hilde
AU  - Schneider, Claus M.
AU  - Tautz, Frank Stefan
AU  - Juschkin, Larissa
TI  - Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy
JO  - Applied physics letters
VL  - 108
IS  - 23
SN  - 1077-3118
CY  - Melville, NY
PB  - American Inst. of Physics
M1  - FZJ-2016-03343
SP  - 234101 -
PY  - 2016
AB  - We report on the combination of a state-of-the-art energy-filtering photoemission electron microscope with an intense yet compact laboratory-based gas discharge extreme ultraviolet (EUV) light source. Using a photon energy of 71.7 eV from oxygen plasma (O5+ spectral line), we demonstrate element-selective photoelectron imaging in real space and band structure mapping in reciprocal space. Additionally, the high surface sensitivity of the EUV light was used to study the surface oxidation on islands of the phase-change material Ge1Sb2Te4. The EUV light source allows the extension of spectromicroscopy, previously only feasible at synchrotron beamlines, to laboratory-based work.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000378924700055
DO  - DOI:10.1063/1.4953071
UR  - https://juser.fz-juelich.de/record/810751
ER  -