Journal Article

FZJ-2016-03343

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

Schmitz, C. (Corresponding author)FZJ* ; Wilson, D.FZJ* ; Rudolf, D.FZJ* ; Wiemann, C.FZJ* ; Plucinski, L.FZJ* ; Riess, S.FZJ* ; Schuck, M.FZJ* ; Hardtdegen, H.FZJ* ; Schneider, C. M.FZJ* ; Tautz, F. S.FZJ* ; Juschkin, L.FZJ*

2016
American Inst. of Physics Melville, NY

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Please use a persistent id in citations: http://hdl.handle.net/2128/17259  doi:10.1063/1.4953071

Abstract: We report on the combination of a state-of-the-art energy-filtering photoemission electron microscope with an intense yet compact laboratory-based gas discharge extreme ultraviolet (EUV) light source. Using a photon energy of 71.7 eV from oxygen plasma (O5+ spectral line), we demonstrate element-selective photoelectron imaging in real space and band structure mapping in reciprocal space. Additionally, the high surface sensitivity of the EUV light was used to study the surface oxidation on islands of the phase-change material Ge1Sb2Te4. The EUV light source allows the extension of spectromicroscopy, previously only feasible at synchrotron beamlines, to laboratory-based work.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)
2. Elektronische Eigenschaften (PGI-6)
3. Funktionale Nanostrukturen an Oberflächen (PGI-3)
4. JARA-FIT (JARA-FIT)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016

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Database coverage:
; ; Current Contents - Physical, Chemical and Earth Sciences ; IF < 5 ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

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