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@ARTICLE{Schmitz:810751,
author = {Schmitz, Christoph and Wilson, Daniel and Rudolf, Denis and
Wiemann, Carsten and Plucinski, Lukasz and Riess, Sally and
Schuck, Martin and Hardtdegen, Hilde and Schneider, Claus M.
and Tautz, Frank Stefan and Juschkin, Larissa},
title = {{C}ompact extreme ultraviolet source for laboratory-based
photoemission spectromicroscopy},
journal = {Applied physics letters},
volume = {108},
number = {23},
issn = {1077-3118},
address = {Melville, NY},
publisher = {American Inst. of Physics},
reportid = {FZJ-2016-03343},
pages = {234101 -},
year = {2016},
abstract = {We report on the combination of a state-of-the-art
energy-filtering photoemission electron microscope with an
intense yet compact laboratory-based gas discharge extreme
ultraviolet (EUV) light source. Using a photon energy of
71.7 eV from oxygen plasma (O5+ spectral line), we
demonstrate element-selective photoelectron imaging in real
space and band structure mapping in reciprocal space.
Additionally, the high surface sensitivity of the EUV light
was used to study the surface oxidation on islands of the
phase-change material Ge1Sb2Te4. The EUV light source allows
the extension of spectromicroscopy, previously only feasible
at synchrotron beamlines, to laboratory-based work.},
cin = {PGI-9 / PGI-6 / PGI-3 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / I:(DE-Juel1)PGI-6-20110106 /
I:(DE-Juel1)PGI-3-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000378924700055},
doi = {10.1063/1.4953071},
url = {https://juser.fz-juelich.de/record/810751},
}