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@INPROCEEDINGS{Liu:821184,
author = {Liu, Chang and Han, Qinghua and Luong, Gia Vinh and
Narimani, Keyvan and Glass, Stefan and Tiedemann, Andreas
and Trellenkamp, Stefan and Yu, Wenjie and Wang, Xi and
Mantl, Siegfried and Zhao, Qing-Tai},
title = {{S}i n-{TFET}s on ultra thin body with suppressed
ambipolarity},
publisher = {IEEE},
reportid = {FZJ-2016-06422},
isbn = {978-1-5090-2969-3},
pages = {408-411},
year = {2016},
abstract = {This paper presents an ultra thin body Si n-TFET which
exploits a multi-finger gate layout and steep junction
formed by dopant implantation into silicide (IIS) process.
The sub-threshold slope (SS) reaches a minimum value of
about 45 mV/dec, average SS of <;60mV/dec and 71mV/dec over
one and three decades of drain current, respectively. A
remarkable high Ion/Ioff ratio (~109) is achieved due to the
successfully suppressed ambipolar behavior by the asymmetric
source and drain design.},
month = {Dec},
date = {9122016},
organization = {ESSDERC 2016 - 46th European
Solid-State Device Research Conference,
Lausanne (Switzerland), 12 Sep 2016 -
15 Sep 2016},
cin = {PGI-9 / JARA-FIT / PGI-8-PT},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$ /
I:(DE-Juel1)PGI-8-PT-20110228},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
doi = {10.1109/ESSDERC.2016.7599672},
url = {https://juser.fz-juelich.de/record/821184},
}